1 Surface and Interface Physics: Its Definition and Importance
Panel Ⅰ: Ultrahigh Vacuum (UHV) Technology
Panel Ⅱ: Basics of Particle Optics and Spectroscopy
Problems
2 Preparation ofWell-Defined Surfaces,lnterfaces and Thin Films
2.1 Why Is Ultrahigh Vacuum Used?
2.2 Cleavage in UHV
2.3 Ion Bombardment and Annealing
2.4 Evaporation and Molecular Beam Epitaxy (MBE)
2.5 Epitaxy by Means of Chemical Reactions
Panel Ⅲ: Auger Electron Spectroscopy (AES)
Panel Ⅳ:Secondary Ion Mass Spectroscopy (SIMS)
Problems
3 Morphology and Structure ofSurfaces,lnterfaces and Thin Films
3.1 Surface Stress, Surface Energy, and Macroscopic Shape
3.2 Relaxation, Reconstruction, and Defects
3.3 Two-Dimensional Lattices, Superstructure, and Reciprocal Space
3.3.1 Surface Lattices and Superstructures
3.3.2 2D Reciprocal Lattice
3.4 Structural Models of Solid-Solid Interfaces
3.5 Nucleation and Growth of Thin Films
3.5.1 Modes of Film Growth
3.5.2 Capillary Model of Nucleation
3.6 Film-Growth Studies: Experimental Methods and Some Results
Panel V: Scanning Electron Microscopy (SEM) and Microprobe Techniques
Panel VI: Scanning Tunneling Microscopy (STM)
PaneI VII:Surface Extended X-Ray Absorption Fine Structur (SEXAFS)
Problems
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4 Scattering from Surfaces and Thin Films
5 Surface Phonons
6 Electronic Surface States
7 Space-Charge Layers at Semiconductor Interfaces
8 Metal-Semiconductor Junctions and Semiconductor Heterostructures
9 Collective Phenomena at Interfaces: Superconductivity and Ferromagnetism
10 Adsorption on Solid Surfaces
References
Index
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